鈦靶材
產(chǎn)品詳情-------------------------------------------------------------------------
品名:靶材
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牌號:Ta1 Ta2
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純度:≥99.95%
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密度:16.67g/cm3
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用途:鉭濺射靶材是通過壓力加工獲得的鉭片材,化學(xué)純度高,晶粒尺寸小,再結(jié)晶
組織和三個軸向的一致性好,主要應(yīng)用于光導(dǎo)纖維,半導(dǎo)體晶片和集成電路的濺射沉積
鍍膜,靶材可用于陰極濺射涂層,高真空吸氣活性材料等.是重要的薄膜技術(shù)用材料
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